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IDW/AD '12 Best Paper Award Winners
LCT6-1 | The World’ s First Photo-Aligned IPS-LCDs for a TV Use H. Matsukawa, Y. Shimano, M. Suefuji, Y.Umeda, K. Mimura (Panasonic Liquid Crystal Display, Japan) |
AMD7-3 | The Influence of New SiNX Gate Insulator in a-InGaZnO Thin Film Transistors
H. Yamazaki, Y. Ishikawa, Y. Ueoka, M. Fujiwara*, E. Takahashi*, Y. Andoh*, Y. Uraoka (Nara Inst. of S&T, Japan, *Nissin Elec., Japan ) |
FMCp-6 | Cellulose Ether Polymers as Optical Compensation Films for LCDs-High Birefringence and Tunable Optics
Z. Wang, J. Folkenroth*, W. Zhou**, Y. Zhang, X. Shi (Dow Chem., China, *Dow Wolff Cellulosics, USA, **Dow Materials Sci., USA) |
PDP3-1 | A Mechanism of Seed Electron Emission from MgO Nano-Powders for AC PDPs J.-K. Kim, Y.-S. Kim*, L. F. Weber** (Seoul Nat. Univ. of S&T, Korea, *Hongik Univ., Korea, **Consultant, USA) |
PH4-3L | Luminescence Properties of Novel Nitride-Based Yellow Phosphor for White Light-Emitting Diodes
S. Takashina, A. Ohto (Mitsubishi Chem., Japan) |
OLED6-1 | TFT Backplane Technologies with Low Temperature Process for Flexible AMOLED
H.-H. Hsieh, C.-S. Yang, C.-J. Liu, C.-H. Tsai, C.-H. Fang, C.-S. Chuang (AU Optronics, Taiwan) |
3D1-2 | Stereoscopic Viewing Space Analysis Based on Interocular Differences in Contrast
T. Horikoshi, S. Kimura (NTT DoCoMo, Japan) |
VHF8-4L | Resolution Limits for Smartphone Displays
L. Spencer, M. Jakobsen, S. Shah, G. Cairns, H. Washio*, H. Nishishiba* (Sharp Labs. of Europe, UK, *Sharp, Japan) |
PRJ4-4L | High-Power, Long-Lifetime Green Laser Diodes with Wavelengths above 525 nm Grown on Semipolar {20-21} GaN Substrates
K. Tasai, H. Nakajima, K. Naganuma, Y. Takiguchi, T. Hamaguchi, N. Futagawa, K. Yanashima, M. Ikeda, Y. Enya*, S. Takagi*, M. Adachi*, T. Kyono*, Y. Yoshizumi*, T. Sumitomo*, Y. Yamanaka, T. Kumano*, S. Tokuyama*, K. Sumiyoshi*, N. Saga*, M. Ueno*, K. Katayama*, T. Ikegami*, T. Nakamura* (Sony, Japan, *Sumitomo Elec. Inds., Japan) |
EP3-3 | Multicolor Electrochromic Device with Electrochemically Size-Controlled Silver Nanoparticles
A. Tsuboi, K. Nakamura, N. Kobayashi (Chiba Univ., Japan) |
DES5-4 | Texture Significant Hash Function with Robust Occlusion Handling for Fast Inpainting the Virtualized-Reality Models
K. Thangamani*'**, T. Ishikawa**, K.Makita**, T. Kurata*'** (*Univ. of Tsukuba, Japan, **AIST, Japan) |
FLX1/AMD2-3 | Super Low-Temperature Formation of Polycrystalline Silicon Films on Plastic Substrates by Underwater Laser Annealing E. Machida*, M. Horita*'**, Y. Ishikawa*'**, Y. Uraoka*'**, T. Okuyama***, H. Ikenoue**** (*Nara Inst. of S&T, Japan, **JST, Japan, ***TOYOBO, Japan, ****Kyushu Univ., Japan) |
INP3/AMD6-3 | In-Cell Projected Capacitive Touch Panel Technology
Y. Sugita, K. Kida, S. Yamagishi (Sharp, Japan) |
IDW/AD '12 Outstanding Poster Paper Award Winners
LCTp1-1 | Substitute Effect of Fluorine-Containing Polyimides on Photo Alignment Characteristics as an Alignment Layer
S. Sato, H. Ito, T. Mizunuma, K. Nagai, H. Matsumoto, S. Matsumoto (Meiji Univ., Japan) |
LCTp3-8 | Polarization-Dependence on Light Absorption in Dye-Doped Twisted Nematic LC Mode without Polarizers
H. J. Lee, S.-W. Oh, M.-K. Park, K.-W. Park, J.-S. Park, H.-R. Kim (Kyungpook Nat. Univ., Korea) |
LCTp3-9 | Polymer Stabilization of Reverse Twisted Nematic LCD with UV Curable LC Monomer
M. Akimoto, N. Atomi, M. Nishitateno, M. Sannomiya, K. Takatoh, S. Kobayashi (Tokyo Univ. of Sci. Yamaguchi, Japan) |
AMDp2-1 | Device Performance of Benzothienobenzothiophene-Based Top-Gate Organic Field-Effect Transistors with Embedded Electrodes
Y. Kimura, F. Mochizuki, T. Nagase, T. Kobayashi, K. Takimiya*, M. Ikeda**'***, H. Naito (Osaka Pref. Univ., Japan, *Hiroshima Univ., Japan, **Nippon Kayaku, Japan, ***Kyushu Univ., Japan) |
FMCp-20L | Improvement of Surface Strength for Cover Glasses
H. Ohkawa, H. Saiki, A. Nakagawa, M. Fukawa, N. Ishimaru (Asahi Glass, Japan) |
FMCp-24L | Uniform IGZO Layers by Large Area Sputter Deposition from Rotary Targets
E. Scheer, D. K. Yim*, Y. Ye* (Appl. Materials, Germany, *Appl. Materials, USA) |
PDPp-4L | Crystal Growth of MgO Thin Films with Co Nanoparticles Deposited Using Arc Plasma Gun
H. Kosuga, H. Yoshioka*, S. Yamamoto (Ryukoku Univ., Japan, *Hyogo Pref. Inst. of Tech., Japan) |
PHp-1 | Novel Oxynitride Phosphors; La4-xCaxSi12O3+xN18-x:Eu2+ and Ce4-xCaxSi12O3+xN18-x:Eu2+
W. B. Park, Y. Jeong, K.-S. Sohn (Sunchon Nat. Univ., Korea) |
PHp-7 | Coating Method of ZnS Layer for InP Quantum Dot by Solvothermal Method
S. Akiyama, N. Funaki, T. Kurabayashi, T. Fukuda, N. Kamata, Y. Ishimaru (Saitama Univ., Japan) |
PHp-18 | Recent Progress in the Development of Ce3+-Activated Fluorosulfide and Fluorooxysulfide Phosphors for LED Lighting
T.-M. Chen, Y.-C. Wu, C.-S. Lee, S.-N. Chen (Nat. Chiao Tung Univ., Taiwan) |
OLEDp-10 | Characteristics of Insulator Surface for Stable Operation of Organic Field Effect Transistors K. Suemori, T. Kamata (AIST, Japan) |
OLEDp-16L | Highly Efficient Polymer Light-Emitting Diodes with Conjugated Polyelectrolyte Electron Injection Layers Using Combined Solution Processing Techniques
H. Chang*, M. Suh*, S. W. Kim*, J.-S. Kim*'**, D. Y. Jeon* (*KAIST, Korea, **Imperial College London, UK) |
3Dp-21 | Thermal and Visual 3D Display by Use of Crossed-Mirror Array
R. Kujime, S. Suyama, H. Yamamoto (Univ. of Tokushima, Japan) |
3Dp-25 | Holographic Collimator for Reconstruction of Display Holograms
H. T. Lin, W.-C. Su, Y.-W. Wang (Nat. Changhua Univ. of Education, Taiwan) |
3Dp-30 | Fatige-Proof Intelligent Shoot-Right 3D Video Recording System-AUOSOME-3D
C. P. Chen, C. P. Lin, T. Y. Wu, C. C. Yu, H. Lee, Y. H. Chen, J. L. Tung*, C. W. Chen*, N. W. Chang*, I. L. Chen*, C. H. Wen**, P. L. Sun**, H. H. Chen** (Nat. Taiwan Univ., Taiwan, *AU Optronics, Taiwan, **Nat. Taiwan Univ. of S&T, Taiwan) |
VHFp-2 | Fast Detection Method for Perceptive Curves
T. Takagi, F. Saitoh (Gifu Univ., Japan) |
EPp-16L | Rough and Smooth ITO Films Fabricated by Spray CVD for Transparent-Mirror-Black Three-Way Electrochemical Smart Window
R. Onodera, Y. Seki*, S. Seki, K. Yamada*, Y. Sawada*, T. Uchida* (Sendai Nat. College of Tech., Japan, *Tokyo Polytechnic Univ., Japan) |
FLXp-4L | Novel Dielectric Metal Foil Substrates Using Anodic Aluminum Oxide for Flexible Electronics
S. Yuuya, R. Kaito, K. Sato, K. Yamane (FUJIFILM, Japan) |